Kodi ma gasi omwe amagwiritsidwa ntchito kwambiri pa dry etching ndi ati?

Dry etching Technology ndi imodzi mwazinthu zofunika kwambiri. Mpweya wouma wowuma ndi chinthu chofunikira kwambiri popanga semiconductor komanso gwero lofunikira lamafuta a plasma etching. Kuchita kwake kumakhudza mwachindunji ubwino ndi ntchito ya mankhwala omaliza. Nkhaniyi imagawana makamaka zomwe zimagwiritsidwa ntchito kwambiri popangira mpweya wowuma.

Mipweya yochokera ku fluorine: mongacarbon tetrafluoride (CF4), hexafluoroethane (C2F6), trifluoromethane (CHF3) ndi perfluoropropane (C3F8). Mipweya iyi imatha kupanga ma fluoride osasunthika pamene etching silicon ndi silicon compounds, potero kukwaniritsa kuchotsa zinthu.

Mipweya yochokera ku chlorine: monga chlorine (Cl2),boron trichloride (BCl3)ndi silicon tetrachloride (SiCl4). Mipweya yochokera ku klorini imatha kupereka ayoni a kloridi panthawi ya etching, yomwe imathandizira kukweza kuchuluka kwa etching ndi kusankha.

Mipweya yochokera ku bromine: monga bromine (Br2) ndi bromine iodide (IBr). Mipweya yochokera ku bromine imatha kupereka magwiridwe antchito abwinoko pamakina ena, makamaka pakuyika zida zolimba monga silicon carbide.

Mipweya yochokera ku nayitrojeni ndi mpweya: monga nitrogen trifluoride (NF3) ndi oxygen (O2). Mipweya imeneyi nthawi zambiri ntchito kusintha mmene zinthu mu ndondomeko etching kusintha selectivity ndi directionality wa etching.

Mipweya iyi imakwaniritsa kukhazikika bwino kwa zinthuzo kudzera pakuphatikizika kwa sputters ndi machitidwe amankhwala panthawi ya etching ya plasma. Kusankhidwa kwa gasi wa etching kumatengera mtundu wazinthu zomwe zikuyenera kuzikika, zomwe zimafunikira pakusankhidwa kwa etching, komanso kuchuluka komwe mukufuna.